Application：

Used in silicon wafer polishing, glass polishing, LCD-TFT polishing, crystal polishing, etc. Nano-cerium oxide polishing slurry adopts nano-dispersion technology to disperse nano-cerium oxide powder in aqueous medium to form dispersion, homogenization and stabilization. The nano-cerium oxide polishing slurry has the characteristics of good suspension stability, uniform particles, good polishing rate, and excellent surface performance .

Technical parameter: